Patents
Machine learning innovations for semiconductor metrology, defect inspection, and image enhancement
Showing 10 patents
2024
Diversifying SEM Measurement Schemes
View Patent →WO2024165248A1 · 2024
Diversifying SEM measurement schemes for improved accuracy
High-Resolution Information from Low-Resolution Images
View Patent →WO2024013161A1 · 2024
Obtaining high resolution information from low resolution images
2025
Method and System for Predicting Metrology Data Using a Neural Network
View Patent →WO2025247596A1 · 2025
Neural network-based prediction of metrology data
Performance Cost-Based Training Dataset Generation for Mask Prediction
View Patent →WO2025223790A1 · 2025
Method and system for performance cost-based training dataset generation for mask prediction
Pellicle Membrane for EUV Utilization Apparatus
View Patent →WO2025201829A1 · 2025
Pellicle membrane for an EUV utilization apparatus and method of manufacturing thereof
Defect Identification and Segmentation Without Labeled Data
View Patent →EP4607460A2 · 2025
Defect identification/segmentation without labeled data and image quality enhancement
Measurement Charge Removal Using Diffusion Models
View Patent →EP4607453A2 · 2025
Measurement charge removal and per-layer stack geometry inference using diffusion models
Primitive-Based Mask Prediction
View Patent →WO2025124841A1 · 2025
Method and system for primitive-based mask prediction
Contrastive Deep Learning for Defect Inspection
View Patent →WO2025108661A1 · 2025
Contrastive deep learning for defect inspection
Data Processing Method for Charged Particle Assessment
View Patent →WO2025026668A1 · 2025
Data processing method, charged particle assessment method and system
No patents found matching your criteria.